Chemical liquid, chemical liquid storage body, resist pattern forming method, and semiconductor chip manufacturing method
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United States of America
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Feb 25, 2025
Grant Date -
Jul 22, 2021
app pub date -
Mar 31, 2021
filing date -
Mar 31, 2021
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Abstract
The present invention provides a chemical liquid which makes it possible to obtain a resist pattern while inhibiting pattern interval variation in a case where the chemical liquid is used as a developer or rinsing solution. The present invention also provides a chemical liquid storage body, a resist pattern forming method, and a semiconductor chip manufacturing method. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing n-butyl acetate and isobutyl acetate, in which a content of the n-butyl acetate is 99.000% to 99.999% by mass with respect to a total mass of the chemical liquid, and a content of the isobutyl acetate is 1.0 to 1,000 mass ppm with respect to the total mass of the chemical liquid.
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