EUV photomask and manufacturing method of the same
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
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Feb 25, 2025
Grant Date -
Nov 30, 2023
app pub date -
Jul 30, 2023
filing date -
Jul 30, 2023
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer including molybdenum layers and silicon layers over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and performing a treatment to form a border region including molybdenum silicide in the reflective layer.
First Claim
Other Claims data not available
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| Country | kind | publication No. | Filing Date | Type | Sub-Type |
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International Classification(s)
- 2023 Application Filing Year
- G03F Class
- 1481 Applications Filed
- 296 Patents Issued To-Date
- 19.99 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- < 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Aug 25, 2028 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Aug 25, 2032 |
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