Substrate processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America
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Feb 25, 2025
Grant Date -
Jun 1, 2023
app pub date -
Sep 9, 2022
filing date -
Sep 9, 2022
priority date (Note) -
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Abstract
A substrate processing apparatus includes: a chamber configured to perform a wet process and having an internal space, a chuck in the internal spaced and being configured for loading a semiconductor substrate thereon, a probe having an end above the chuck and including an electro-optical crystal and a reflective mirror on one surface of the electro-optical crystal, a measuring unit connected to the probe and configured to provide reference light to the probe, and to detect a polarization component of reflected light reflected from the one end of the probe by the reference light, and a controller configured to calculate an amount of electrostatic charge on a surface of the semiconductor substrate from the polarization component.
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