Fatigue-free bipolar loop treatment to reduce imprint effect in piezoelectric device

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United States of America

PATENT NO 12232424
APP PUB NO 20240099147A1
SERIAL NO

18513918

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Abstract

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In some embodiments, the present disclosure relates to a method in which a first set of one or more voltage pulses is applied to a piezoelectric device over a first time period. During the first time period, the method determines whether a performance parameter of the piezoelectric device has a first value that deviates from a reference value by more than a predetermined value. Based on whether the first value deviates from the reference value by more than the predetermined value, the method selectively applies a second set of one or more voltage pulses to the piezoelectric device over a second time period. The second time period is after the first time period and the second set of one or more voltage pulses differs in magnitude and/or polarity from the first set of one or more voltage pulses.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Shih-Fen Jhubei, TW 87 331
Liao, Yan-Jie Hsinchu, TW 17 12
Lin, You-Ru New Taipei, TW 33 1313
Shih, Chi-Yuan Hsinchu, TW 74 698

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