Imprint apparatus, imprint method, article manufacturing method, and storage medium
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United States of America
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Feb 18, 2025
Grant Date -
Jun 16, 2022
app pub date -
Dec 6, 2021
filing date -
Dec 6, 2021
priority date (Note) -
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status (Latency Note)
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Abstract
An imprint apparatus capable of stably maintaining the concentration of gas supplied for imprint processing is provided even after the moving direction of a substrate is changed by comprising a gas supply port, and when the moving direction or the substrate is changed so that a next target shot region is to be imprinted, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region of a mold from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction so that the next target shot region and the pattern region face each other while supplying the gas from the gas supply port, and then the next target shot region is imprinted by the pattern region.
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