Method and system for control of sidewall orientation in vertical gallium nitride field effect transistors

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12224344
APP PUB NO 20220328688A1
SERIAL NO

17707835

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Abstract

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A III-N-based vertical transistor includes a III-N substrate, a source, a drain, and a channel comprising a III-N crystal material and extending between the source and the drain. The channel includes at least one sidewall surface aligned ±0.3° with respect to an m-plane of the III-N crystal material. The III-N-based vertical transistor also includes a gate electrically coupled to the at least one sidewall surface of the channel.

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Patent Owner(s)

  • SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Craven, Michael Santa Clara, US 5 858
Cui, Hao Santa Clara, US 83 993
DeMuynck, David Santa Clara, US 2 0
Drowley, Clifford Santa Clara, US 36 11
Edwards, Andrew P Santa Clara, US 80 446
Pidaparthi, Subhash Srinivas Santa Clara, US 33 15

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