Substrate processing system and method for controlling substrate processing system

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12224194
APP PUB NO 20220230904A1
SERIAL NO

17595631

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Abstract

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A substrate processing system, which includes a transfer device configured to simultaneously transfer a plurality of substrates and suitably corrects positions of the substrate, and a method of controlling the substrate processing system are provided. The substrate processing system includes: a process chamber in which a plurality of substrates is processed; a vacuum transfer chamber connected to the process chamber; a transfer device provided in the vacuum transfer chamber and configured to simultaneously transfer a plurality of substrates; a module connected to the vacuum transfer chamber and having a plurality of stages on which substrates are placed; and a controller. The controller is configured to measure an amount of change of an arm of the transfer device that has transferred processed substrates, and to correct positions of the stages based on the amount of change of the arm of the transfer device.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kubo, Atsushi Tokyo, JP 91 657

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