Stop, optical system and lithography apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12222655
APP PUB NO 20220107567A1
SERIAL NO

17554029

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Importance

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Abstract

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A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.

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Patent Owner(s)

  • CARL ZEISS SMT GMBH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Golde, Daniel Oberkochen, DE 5 8
Gruner, Toralf Aalen-Hofen, DE 173 1727
Loering, Ulrich Ulm, DE 36 581
Modeste, Benjahman Julius Elchingen, DE 2 0
Xalter, Stefan Oberkochen, DE 44 397
Zweering, Ralf Aalen, DE 9 11

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