CVD system with flange assembly for facilitating uniform and laminar flow

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12221695
APP PUB NO 20220372622A1
SERIAL NO

17305209

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Abstract

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A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.

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Patent Owner(s)

Patent OwnerAddress
RAMOT AT TEL-AVIV UNIVERSITY LTDP O BOX 39296 TEL AVIV 6139201

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bar-Rabi, Eran Shimshit, IL 3 10
Ben-Naim, Yosi Eilat, IL 7 18
Gridish, Yaakov Yoqneam Ilit, IL 25 49
Ismach, Ariel Rosh Haain, IL 5 44
Kaufman, Tal Shimshit, IL 3 10
Mentovich, Elad Tel Aviv, IL 202 281
Naveh, Doron Petah-Tikva, IL 14 27
Rotem, Yaniv Nesher, IL 9 20
Stern, Chen Kiryat Ono, IL 4 10

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