RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12217939
APP PUB NO 20220044909A1
SERIAL NO

17451975

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate processing system for processing a substrate within a processing chamber is provided and includes a source terminal, a substrate support, and a tuning circuit. The substrate support holds the substrate and includes first and second electrodes, which receive power from a power source via the source terminal. The tuning circuit is connected to the first electrode or the second electrode. The tuning circuit is allocated for tuning signals provided to the first electrode. The tuning circuit includes at least one of a first impedance set or a second impedance set. The first impedance set is serially connected between the first electrode and the power source and receives a first signal from the power source via the source terminal. The second impedance set is connected between an output of the power source and a reference terminal and receives the first signal from the power source via the source terminal.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATIONFREMONT CA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burkhart, Vincent E Cupertino, US 31 1336
French, David Fort Myers, US 51 259
Leeser, Karl Frederick West Linn, US 61 67
Meng, Liang Sherwood, US 23 484

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