Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12211709
APP PUB NO 20230369076A1
SERIAL NO

18217696

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Abstract

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Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, designs for a light blocking structure used with the showerheads are also provided.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATIONFREMONT CA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Amburose, Gnanamani Fremont, US 8 18
Cheung, David Foster City, US 153 7553
Fang, Haoquan Sunnyvale, US 21 196
Ko, Eunsuk San Jose, US 6 18
Luo, Weiyi Fremont, US 6 128
Yang, Dengliang Union City, US 19 569
Zhang, Dan Fremont, US 280 889

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