Mirror, in particular for a microlithographic projection exposure apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12210289
APP PUB NO 20230122333A1
SERIAL NO

18082964

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Abstract

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A mirror, e.g. for a microlithographic projection exposure apparatus, includes an optical effective surface, a mirror substrate, a reflection layer stack for reflecting electromagnetic radiation incident on the optical effective surface, at least one first electrode arrangement, at least one second electrode arrangement, and an actuator layer system situated between the first and the second electrode arrangements. The actuator layer system is arranged between the mirror substrate and the reflection layer stack, has a piezoelectric layer, and reacts to an electrical voltage applied between the first and the second electrode arrangements with a deformation response in a direction perpendicular to the optical effective surface. The deformation response varies locally by at least 20% in PV value for a predefined electrical voltage that is spatially constant across the piezoelectric layer.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBH73447 OBERKOCHEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Golde, Daniel Oberkochen, DE 5 8
Gruner, Toralf Aalen, DE 173 1727
Hild, Kerstin Waldstetten, DE 18 31
Shklover, Vitaliy Heidenheim, DE 20 56
Stiepan, Hans Michael Aalen, DE 6 2

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