Method of deposition

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United States of America Patent

PATENT NO 12207556
APP PUB NO 20200365794A1
SERIAL NO

16865227

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Abstract

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In a method for sputter depositing an additive-containing aluminium nitride film containing an additive element like Sc or Y, a first layer of the additive-containing aluminium nitride film is deposited onto a substrate disposed within a chamber by pulsed DC reactive sputtering. A second layer of the additive-containing aluminium nitride film is deposited onto the first layer by pulsed DC reactive sputtering. The second layer has the same composition as the first layer. A gas or gaseous mixture is introduced into the chamber when depositing the first layer. A gaseous mixture comprising nitrogen gas and an inert gas is introduced into the chamber when depositing the second layer. The percentage of nitrogen gas in the flow rate (in sccm) when depositing the first layer is greater than that when depositing the second layer.

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Patent Owner(s)

Patent OwnerAddress
SPTS TECHNOLOGIES LIMITEDCOED RHEDYN RINGLAND WAY NEWPORT NP18 2TA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burgess, Steve Newport, GB 17 10
Haymore, Scott Newport, GB 15 13
Rastogi, Amit Newport, GB 8 16
Thomas, Adrian Newport, GB 17 22
Wilby, Tony Newport, GB 9 23

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