Target supply system, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
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United States of America Patent
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Jan 21, 2025
Grant Date -
Sep 7, 2023
app pub date -
Feb 1, 2023
filing date -
Mar 1, 2022
priority date (Note) -
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Abstract
A target supply system includes a target generation unit configured to generate a liquid target substance by melting a solid target substance at an inside thereof, and output the liquid target substance; an input mechanism configured to introduce the solid target substance to the target generation unit; a heater arranged at the target generation unit; a sensor configured to detect a temperature of the target generation unit; and a processor configured to control an input timing at which the solid target substance is introduced to the target generation unit, perform feedback control on the heater based on a present temperature detected by the sensor, and perform feedforward control on the heater based on the input timing while performing feedback control on the heater.
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