Oxide semiconductor film and semiconductor device

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United States of America Patent

PATENT NO 12206023
APP PUB NO 20240079499A1
SERIAL NO

18381668

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Abstract

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To provide an oxide semiconductor film having stable electric conductivity and a highly reliable semiconductor device having stable electric characteristics by using the oxide semiconductor film. The oxide semiconductor film contains indium (In), gallium (Ga), and zinc (Zn) and includes a c-axis-aligned crystalline region aligned in the direction parallel to a normal vector of a surface where the oxide semiconductor film is formed. Further, the composition of the c-axis-aligned crystalline region is represented by In1+δGa1−δO3(ZnO)m (0<δ<1 and m=1 to 3 are satisfied), and the composition of the entire oxide semiconductor film including the c-axis-aligned crystalline region is represented by InxGayO3(ZnO)m (0

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Patent Owner(s)

  • SEMICONDUCTOR ENERGY LABORATORY CO. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akimoto, Kengo Atsugi, JP 441 44355
Takahashi, Masahiro Atsugi, JP 489 7038
Yamazaki, Shunpei Setagaya, JP 7534 239327

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