Antenna structure and plasma generating device using same

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United States of America Patent

PATENT NO 12205794
APP PUB NO 20230139675A1
SERIAL NO

17759987

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Abstract

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This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.

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Patent Owner(s)

Patent OwnerAddress
EN2CORE TECHNOLOGY INC77 JUKDONG-RO YUSEONG-GU DAEJEON 34127

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Yun Seong Daejeon, KR 17 111
Park, Se Hong Daejeon, KR 19 72
Sohn, Yeong Hoon Daejeon, KR 7 6
Uhm, Sae Hoon Gyeonggi-do, KR 18 59

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