Metrology system configured to illuminate and measure apertures of workpieces
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 21, 2025
Grant Date -
Nov 28, 2024
app pub date -
May 25, 2023
filing date -
May 25, 2023
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A metrology system includes front and back vision components portions, and is configured to have a workpiece positioned between the two portions. The back vision components portion includes a light source and a diffuser. The front vision components portion includes a variable focal length lens, an objective lens and a camera. The metrology system includes a movement mechanism portion configured to align relative positions between the front and back vision components portions and an aperture defined through the workpiece such that at least a portion of the light from the light source that passes through the diffuser passes through the aperture for providing the illumination for imaging the aperture. The camera acquires an image stack of images of the aperture at different focus positions. Based on an analysis of the image stack, measurements related to workpiece features of the aperture (e.g., including a distance between workpiece features) can be determined.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully