Metrology system configured to illuminate and measure apertures of workpieces

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12204226
APP PUB NO 20240393657A1
SERIAL NO

18324027

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Abstract

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A metrology system includes front and back vision components portions, and is configured to have a workpiece positioned between the two portions. The back vision components portion includes a light source and a diffuser. The front vision components portion includes a variable focal length lens, an objective lens and a camera. The metrology system includes a movement mechanism portion configured to align relative positions between the front and back vision components portions and an aperture defined through the workpiece such that at least a portion of the light from the light source that passes through the diffuser passes through the aperture for providing the illumination for imaging the aperture. The camera acquires an image stack of images of the aperture at different focus positions. Based on an analysis of the image stack, measurements related to workpiece features of the aperture (e.g., including a distance between workpiece features) can be determined.

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Patent Owner(s)

Patent OwnerAddress
MITUTOYO CORPORATION20-1 SAKADO 1-CHOME TAKATSU-KU KAWASAKI KANAGAWA 213-8533

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gladnick, Paul Gerard Seattle, US 25 284
Hamner, Christopher Richard Kirkland, US 12 37
Nagornykh, Pavel Ivanovich Kirkland, US 3 0

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