Apparatus for treating gaseous pollutant with plasma

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United States of America Patent

PATENT NO 12203651
APP PUB NO 20230003380A1
SERIAL NO

17774712

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Abstract

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An apparatus for treating gaseous pollutant with plasma comprises a microwave source generating a microwave oscillation; a waveguide component coupled to the microwave source; and a resonant cavity coupled to the waveguide component, the microwave oscillation is substantially propagated toward a waveguide direction, the resonant cavity comprises a first chamber and a second chamber, the waveguide direction is substantially parallel to a reference axis defined in the first chamber, the first chamber has an inner wall surrounding the reference axis, the inner wall comprises a first inner wall obliquely inclined toward the reference axis and a second inner wall substantially parallel in respect to the reference axis relatively, an area of the first inner wall is larger than that of the second inner wall so that the first chamber has a tapered space, and the microwave oscillation interacts with an ignition gas in the second chamber to generate a torch.

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Patent Owner(s)

Patent OwnerAddress
BHT SERVICES PTE LTD30 KALLANG PLACE #01-23/24 KALLANG BASIN INDUSTRIAL ESTATE SINGAPORE 339159

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chan, Chee Wei Kallang, SG 5 0

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