System and method for chemical mechanical polishing pad replacement

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12202094
APP PUB NO 20230009839A1
SERIAL NO

17579775

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Abstract

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A system and method for chemical mechanical polishing (“CMP”) pad replacement on a CMP processing tool. A platen carrier having two or more platens is positioned within a platen cleaning process module. Each platen includes a CMP pad affixed thereto, and is capable of being independently rotated during operations. When a pad requires replacement, the platen carrier rotates towards a pad tearer tool, which extends and pivots to remove the used pad from the platen as the carrier rotates. A pad tape replacement module is positioned above the CMP tool with pad tape extending from a supply roll to a recycle roll. As the pad tape transits through the module, a backing of the tape is separated and recycled. A pad disposed in the pad tape is then applied to a platen via a pressure roller.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chun Yan Zhubei, TW 13 7
Chen, Shih-Chung Hsinchu, TW 26 171
Cheng, Ching-Wen Zhubei, TW 51 496
Tu, Wei-Kang Hsinchu, TW 3 1

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