Apparatus and method for plasma treatment of a substrate using automatic water replenishment

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United States of America Patent

PATENT NO 12201135
APP PUB NO 20250017242A1
SERIAL NO

18222220

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Abstract

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An apparatus for treating a substrate is disclosed. The apparatus includes a water supply tank with a level line and a reservoir filled with water to the level line. The water supply tank may automatically replenish water upon detection of depletion of water beneath the level line. A reaction chamber is communicatively connected to the water supply tank. The reaction chamber contains a pair of electrodes which define a reaction region between each electrode, where the reaction region may surround the substrate. A control module is communicatively connected to at least the reaction chamber and may a control signal. An injector connects the water supply tank to the reaction chamber may generate a dispersion of microfine water droplets from water extracted from the reservoir in response to receipt of the control signal. A platform may support at least the reaction chamber and lay on a flat surface.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lewis,, III Joseph E Ormond Beach, US 8 42

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