Substrate processing apparatus and noise impact reducing method

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United States of America

PATENT NO 12200826
APP PUB NO 20220070977A1
SERIAL NO

17411603

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Abstract

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A substrate processing apparatus includes an AD converter configured to output digital values of a voltage applied to a heater resistor and a current flowing in the heater resistor; and a controller configured to control a temperature of the heater resistor by using a calculation voltage and a calculation current configured to calculate a resistance value of the heater resistor, which are obtained from an output result of the AD converter. The controller calculates at least one of the calculation voltage or the calculation current, based on a combination result of a digital signal obtained from the output result of the AD converter and a noise signal including a normal distribution noise.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yamada, Kazuhito Miyagi, JP 49 610

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