Low resistance interconnect structure for semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12199036
APP PUB NO 20220359372A1
SERIAL NO

17871532

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Abstract

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The present disclosure describes an interconnect structure and a method forming the same. The interconnect structure can include a substrate, a layer of conductive material over the substrate, a metallic capping layer over the layer of conductive material, a layer of insulating material over top and side surfaces of the metallic capping layer, and a layer of trench conductor formed in the layer of insulating material and the metallic capping layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-77 R O C

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chung, Liang-Chor Hsinchu, TW 16 8
Huang, Jason Hsinchu, TW 71 552
Li, Cheng-Yuan Kaohsiung, TW 14 56

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