Charged particle beam writing apparatus, charged particle beam writing method and recording medium

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12198891
APP PUB NO 20220367143A1
SERIAL NO

17811985

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A difference between a calculated amount of drift and an actual amount of drift is reduced. According to one aspect of the present invention, a charged particle beam writing apparatus includes a deflector adjusting an irradiation position of the charged particle beam with respect to a substrate placed on a stage, a shot data generator generating shot data from writing data, the shot data including a shot position and beam ON and OFF times for each shot, a drift corrector referring to a plurality of pieces of the generated shot data, calculating an amount of drift of the irradiation position of the charged particle beam with which the substrate is irradiated, and generating correction information for correcting an irradiation position deviation based on the amount of drift, a deflection controller controlling a deflection amount achieved by the deflector based on the shot data and the correction information, and a dummy irradiation instructor instructing execution of dummy irradiation in a writing process to irradiate with the charged particle beam in a predetermined irradiation amount at a position different from the substrate on the stage.

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Patent Owner(s)

Patent OwnerAddress
NUFLARE TECHNOLOGY INC8-1 SHINSUGITA-CHO ISOGO-KU YOKOHAMA-SHI KANAGAWA 235-8522

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yamada, Taku Yokohama, JP 48 358

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