Method of determining control parameters of a device manufacturing process

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United States of America

PATENT NO 12197136
APP PUB NO 20240012337A1
SERIAL NO

18229984

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Abstract

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A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature manufactured on the substrate by a manufacturing process including a lithographic process and one or more further processes; determining one or more image-related metrics in dependence on a contour determined from the image, wherein one of the one or more image-related metrics is an edge placement error, EPE, of the at least one feature; and determining one or more control parameters of the lithographic process and/or the one or more further processes in dependence on the edge placement error, wherein at least one control parameter is determined so as to minimize the edge placement error of the at least one feature.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL-5504 DR

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anunciado, Roy Eindhoven, NL 8 24
Jochemsen, Marinus Veldhoven, NL 28 162
Maslow, Mark John Eindhoven, NL 16 62
Slachter, Abraham Waalre, NL 11 27
Staals, Frank Eindhoven, NL 64 340
Tel, Wim Tjibbo Helmond, NL 78 537
Van, Gorp Simon Hendrik Celine Oud-Turnhout, BE 12 18
Van, Ingen Schenau Koenraad Veldhoven, NL 8 11
Warnaar, Patrick Tilburg, NL 61 794

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