Lithography measurement machine and operating method thereof
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United States of America
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Jan 14, 2025
Grant Date -
Apr 13, 2023
app pub date -
Dec 8, 2021
filing date -
Dec 8, 2021
priority date (Note) -
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Abstract
An operating method includes: placing a first mask, a second mask, a third mask and a fourth mask on a rotating base, in which each of the first, second, third and fourth masks has a first exposure unit, a second exposure unit, a third exposure unit and a fourth exposure unit; overlaying the first, second, third and fourth masks such that the first exposure unit of the first mask, the second exposure unit of the second mask, the third exposure unit of the third mask and the fourth exposure unit of the fourth mask are arranged adjacently to form an exposure area; simulating a first coordinate information according to the exposure area by an image simulation unit; scanning the exposure area, by a scanning electron microscope (SEM), to obtain a second coordinate information; and comparing the first coordinate information with the second coordinate information.
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