Compensation method and system for exposure alignment

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United States of America

PATENT NO 12197122
APP PUB NO 20220317558A1
SERIAL NO

17522300

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Abstract

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A compensation method and system for exposure alignment are provided. The method includes: acquiring original data of an aligned pattern, performing first-order processing on the original data to obtain first-order derivative data, obtaining a compensation value based on the original data and the first-order derivative data when exposure alignment has deviation, and compensating the exposure alignment based on the compensation value. According to the compensation method for exposure alignment, the first-order derivative data is obtained by performing first-order processing on the original data, and then the compensation value is obtained based on the original data and the first-order derivative data to compensate the exposure alignment, so that the compensation accuracy is higher, and the accuracy of exposure alignment is optimized.

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Patent Owner(s)

Patent OwnerAddress
CHANGXIN MEMORY TECHNOLOGIES INC230601 NO 388 XINGYE AVENUE AIRPORT INDUSTRIAL PARK HEFEI ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE ANHUI PROVINCE HEFEI CITY ANHUI PROVINCE 230601

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Zhang, Sheng'an Hefei, CN 2 0
Zhao, Lei Hefei, CN 382 2549

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