Systems and methods for faceplate temperature control

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12191169
APP PUB NO 20220020612A1
SERIAL NO

16932792

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Exemplary semiconductor processing systems may include a chamber body including sidewalls and a base. The chamber body may define an interior volume. The processing systems may include a substrate support extending through the base of the chamber body. The substrate support may be configured to support a substrate within the interior volume. The processing systems may include a faceplate positioned within the interior volume of the chamber body. The faceplate may define a plurality of apertures through the faceplate. The processing systems may include a faceplate heater seated on the faceplate. The faceplate heater may include a first heater coil extending proximate a first area of the faceplate. The faceplate heater may include a second heater coil extending proximate a second area of the faceplate.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ha, Sungwon Palo Alto, US 22 426
Pan, Runyun San Jose, US 1 0
Parimi, Venkata Sharat Chandra Sunnyvale, US 25 13

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