Substrate processing apparatus, substrate processing system and substrate processing method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12191153
APP PUB NO 20220277962A1
SERIAL NO

17627147

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Abstract

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A substrate processing apparatus includes a pair of first substrate chucks each configured to hold a substrate from below while allowing a first main surface of the substrate to face upwards; a pair of second substrate chucks each configured to hold the substrate from below while allowing a second main surface of the substrate opposite to the first main surface to face upwards; a rotary table which is configured to be rotated about a rotation axis; a first processing unit equipped with a first processing tool configured to process the first main surface of the substrate held by the first substrate chuck; and a second processing unit equipped with a second processing tool configured to process the second main surface of the substrate held by the second substrate chuck.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO 107-6325

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kaneko, Tomohiro Kumamoto, JP 83 411
Kodama, Munehisa Kumamoto, JP 17 16

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