Metrology data correction using image quality metric

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12189307
APP PUB NO 20210241449A1
SERIAL NO

17268863

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Abstract

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A method for correcting metrology data of a patterning process. The method includes obtaining (i) metrology data of a substrate subjected to the patterning process and (ii) a quality metric (e.g., a focus index) that quantifies a quality of the metrology data of the substrate; establishing a correlation between the quality metric and the metrology data; and determining a correction to the metrology data based on the correlation between the quality metric and the metrology data.

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Patent Owner(s)

Patent OwnerAddress
HERMES MICROVISION INCEAST DIST HSINCHU CITY 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fang, Wei Milpitas, US 197 903
Hunsche, Stefan Santa Clara, US 53 1042
Wang, Fuming Santa Clara, US 48 69

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