EUV vessel perimeter flow auto adjustment
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
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Jan 7, 2025
Grant Date -
Nov 9, 2023
app pub date -
Jul 18, 2023
filing date -
Jul 18, 2023
priority date (Note) -
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status (Latency Note)
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Abstract
In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.
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| Country | kind | publication No. | Filing Date | Type | Sub-Type |
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International Classification(s)
- 2023 Application Filing Year
- G21K Class
- 107 Applications Filed
- 33 Patents Issued To-Date
- 30.85 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- < 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Jul 7, 2028 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jul 7, 2032 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jul 7, 2036 |