Photo-curable composition and methods for preparing cured film, optical component, circuit substrate, electrical component and replica mold using the same

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United States of America

PATENT NO 12189289
APP PUB NO 20240069438A1
SERIAL NO

18496160

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Abstract

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An object is to provide a photo-curable composition having high dry etching resistance and high thermal stability. A photo-curable composition includes at least a polymerizable compound and a photopolymerization initiator, and further includes at least one of a flame retarder and a flame-retardant polymerizable compound.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Toshiki Kanagawa, JP 132 711
Wan, Fen Austin, US 49 286

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