Substrate cleaning line and substrate cleaning system comprising the same

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12186900
APP PUB NO 20230065885A1
SERIAL NO

17671259

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A substrate cleaning line and a substrate cleaning system including the same are disclosed. The substrate cleaning line may include a chamber portion including a plurality of cleaning chambers to clean a substrate, and a first return robot to load, unload, or transfer the substrate from or to the plurality of cleaning chambers, wherein the cleaning chambers may be stacked on each other in a vertical direction.

First Claim

See full text

Other Claims data not available

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
KCTECH CO LTD30 JE2GONGDAN 3-GIL MIYANG-MYEON ANSEONG-SI GYEONGGI-DO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chae, Hee Sung Gyeonggi-do, KR 19 38
Lee, Seung Eun Seoul, KR 125 856
Yun, Geun Sik Gyeonggi-do, KR 9 3

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 0 Citation Count
  • B65G Class
  • 0 % this patent is cited more than
  • < 1 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges6700050100150200250300350400450500550600650700750

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Jul 7, 2028
7.5 Year Payment $3600.00 $1800.00 $900.00 Jul 7, 2032
11.5 Year Payment $7400.00 $3700.00 $1850.00 Jul 7, 2036