Mask synthesis using tensor-based computing platforms
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United States of America
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Dec 31, 2024
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app pub date -
Mar 29, 2021
filing date -
Mar 29, 2021
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Abstract
A tensor-based computing platform performs mask synthesis. A method includes accessing a layout of a lithographic mask and estimating a printed pattern resulting from use of the lithographic mask in a lithographic process. The lithographic process is modeled by a sequence of at least two forward models. A first of the forward models uses the layout of the lithographic mask as input and a last of the forward models produces the estimated printed pattern as output. The method further includes modifying the layout of the lithographic mask based on differences between the estimated printed pattern and a target printed pattern. All of the forward models are implemented on the tensor-based computing platform.
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