Reflective mask blank and reflective mask

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12181790
APP PUB NO 20220283492A1
SERIAL NO

17669986

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Abstract

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A reflective mask blank that is a material for a reflective mask used in EUV lithography using EUV light as exposure light, including a substrate, a multilayer reflection film that is formed on one main surface of the substrate and reflects the exposure light, and an absorber film containing tungsten, and another metal, a metalloid or a light element that is formed on the multilayer reflection film and absorbs the exposure light.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO TOKYO METROPOLIS

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kaneko, Hideo Joetsu, JP 98 438
Mimura, Shohei Joetsu, JP 16 76
Terasawa, Tsuneo Joetsu, JP 82 1439

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