Substrate processing apparatus and substrate processing method
Number of patents in Portfolio can not be more than 2000
United States of America
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Dec 24, 2024
Grant Date -
Oct 3, 2024
app pub date -
Sep 30, 2022
filing date -
Sep 30, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate processing apparatus includes: a substrate rotator configured to hold and rotate a substrate; an outer cup configured to annularly cover a periphery of the substrate held by the substrate rotator; an inner cup disposed inside the outer cup and under the substrate held by the substrate rotator; an annular drain formed between the outer cup and the inner cup to discharge a processing liquid supplied to the substrate outward; and an exhaust passage formed inside the inner cup, wherein the inner cup has an exhaust hole through which a liquid reception space, which is formed by the inner cup and the outer cup, and the exhaust passage are in communication with each other, and the exhaust hole is formed obliquely downward from an outer surface to an inner surface of the inner cup.
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