Substrate processing apparatus, substrate processing method, and non-transitory computer-readable storage medium
Number of patents in Portfolio can not be more than 2000
United States of America
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Dec 24, 2024
Grant Date -
Jul 28, 2022
app pub date -
Apr 9, 2020
filing date -
Apr 9, 2020
priority date (Note) -
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status (Latency Note)
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Abstract
In order to improve the quality of a substrate, a substrate processing apparatus includes a substrate holding unit, a first drive unit, a chemical liquid discharge portion, a cup unit, a second drive unit, and a control unit. The substrate holding unit holds a substrate having a first surface and a second surface opposite to the first surface in a horizontal posture. The first drive unit rotates the substrate holding unit about a virtual axis. The chemical liquid discharge portion discharges a chemical liquid toward the first surface of the substrate held by the substrate holding unit. The cup unit surrounds a periphery of the substrate holding unit. The second drive unit changes a relative position in the vertical direction of the cup unit with respect to the substrate holding unit. The control unit, while causing the first drive unit to rotate the substrate holding unit about the virtual axis and causing the chemical liquid discharge portion to discharge the chemical liquid toward the first surface of the substrate held by the substrate holding unit to execute a chemical liquid treatment of treating the first surface, causes the second drive unit to change the relative position in the vertical direction of the cup unit with respect to the substrate holding unit.
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