Reflection mode photomask
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
Dec 24, 2024
Grant Date -
Nov 9, 2023
app pub date -
Jul 21, 2023
filing date -
Jul 21, 2023
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A reflection mode photomask includes a multilayer over a substrate. The reflection mode photomask further includes a plurality of absorber stacks over the multilayer. Each absorber stack of the plurality of absorber stacks includes an absorber layer, wherein a material of the absorber layer is selected from the group consisting of tantalum oxynitride and tantalum silicon oxynitride. Each absorber stack of the plurality of absorber stacks further includes an anti-reflective coating (ARC) layer on the absorber layer, wherein a material of the ARC layer is selected from the group consisting of tantalum nitride and tantalum silicon.
First Claim
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International Classification(s)
- 2023 Application Filing Year
- H01L Class
- 19835 Applications Filed
- 4214 Patents Issued To-Date
- 21.25 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 1 Age
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