Method for forming micro-lens array and photomask therefor

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United States of America

PATENT NO 12174398
APP PUB NO 20210231840A1
SERIAL NO

17228031

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Abstract

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A method for forming a micro-lens array is provided. According to the method, a substrate is provided, and a hard-mask layer is formed. A lithography process is performed on the hard-mask layer by a hard-mask to form a first pattern and a second pattern. Then, the first pattern and the second pattern are reflowed to form a first lens structure and a second lens structure respectively. The photomask includes a first pattern segment and a second pattern segment, and the second pattern segment includes a transparent region and an opaque region. An area of the transparent region of the second pattern segment is larger than 18% of an area of the second pattern segment.

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Patent Owner(s)

Patent OwnerAddress
VISERA TECHNOLOGIES COMPANY LIMITEDHSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Hao-Min Chiayi, TW 8 31
Lu, Jyun-You Tianzhong Township, Changhua County, TW 3 2
Tsai, Hsin-Yen Zhudong Township, Hsinchu County, TW 4 3

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