Gas cluster processing device and gas cluster processing method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12172198
APP PUB NO 20220143655A1
SERIAL NO

17585274

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Abstract

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There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325
IWATANI CORPORATION6-4 HOMMACHI 3-CHOME CHUO-KU OSAKA 541-0053

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dobashi, Kazuya Nirasaki, JP 42 1046
Izumi, Koichi Hyogo, JP 15 33
Kanehira, Keita Hyogo, JP 2 4
Koike, Kunihiko Hyogo, JP 20 624
Orii, Takehiko Nirasaki, JP 82 1252
Saito, Yukimasa Nirasaki, JP 21 585
Senoo, Takehiko Hyogo, JP 11 218
Shojo, Tadashi Hyogo, JP 4 5
Yoshino, Yu Hyogo, JP 9 308

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