Adaptive modeling misregistration measurement system and method
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United States of America
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Dec 10, 2024
Grant Date -
Dec 8, 2022
app pub date -
Mar 25, 2022
filing date -
Mar 25, 2022
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Abstract
An adaptive modeling method for generating misregistration data for a semiconductor device wafer (SDW) including calculating a fitting function for a group of SDWs (GSDW) having units, including measuring an SDW in said GSDW, thereby generating test data sets corresponding to the units, removing non-unit-specific values (NUSVs) from the test data sets, thereby generating cleaned test data sets, and analyzing the cleaned test data sets, thereby generating the fitting function, and generating misregistration data for at least one additional SDW (ASDW) in the GSDW, including measuring the ASDW, thereby generating run data sets, removing NUSVs from the run data sets, thereby generating cleaned run data sets, fitting each of the cleaned run data sets to the fitting function, thereby generating coefficient sets, and calculating misregistration data for the ASDW, at least partially based on the fitting function and the coefficient sets.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
KLA CORPORATION | ONE TECHNOLOGY DRIVE MILPITAS CA 95035 |
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Levinski, Vladimir | Midal Ha'emek, IL | 106 | 1375 |
Manassen, Amnon | Haifa, IL | 128 | 1032 |
Negri, Daria | Haifa, IL | 36 | 316 |
Reddy, Nireekshan K | Tel Aviv, IL | 8 | 2 |
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