Adaptive modeling misregistration measurement system and method

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United States of America

PATENT NO 12165930
APP PUB NO 20220392809A1
SERIAL NO

17705077

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Abstract

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An adaptive modeling method for generating misregistration data for a semiconductor device wafer (SDW) including calculating a fitting function for a group of SDWs (GSDW) having units, including measuring an SDW in said GSDW, thereby generating test data sets corresponding to the units, removing non-unit-specific values (NUSVs) from the test data sets, thereby generating cleaned test data sets, and analyzing the cleaned test data sets, thereby generating the fitting function, and generating misregistration data for at least one additional SDW (ASDW) in the GSDW, including measuring the ASDW, thereby generating run data sets, removing NUSVs from the run data sets, thereby generating cleaned run data sets, fitting each of the cleaned run data sets to the fitting function, thereby generating coefficient sets, and calculating misregistration data for the ASDW, at least partially based on the fitting function and the coefficient sets.

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Patent Owner(s)

Patent OwnerAddress
KLA CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Levinski, Vladimir Midal Ha'emek, IL 106 1375
Manassen, Amnon Haifa, IL 128 1032
Negri, Daria Haifa, IL 36 316
Reddy, Nireekshan K Tel Aviv, IL 8 2

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