Semiconductor photoresist composition and method of forming patterns using the composition

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United States of America

PATENT NO 12158699
APP PUB NO 20210311387A1
SERIAL NO

17217941

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Abstract

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A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent:

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Patent Owner(s)

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SAMSUNG SDI CO LTDGYEONGGI DO SOUTH KOREA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chae, Seungyong Suwon-si, KR 14 45
Cheon, Hwansung Suwon-si, KR 13 40
Han, Seung Suwon-si, KR 29 36
Kang, Eunmi Suwon-si, KR 10 5
Kim, Jaehyun Suwon-si, KR 446 4512
Kim, Jimin Suwon-si, KR 57 234
Kim, Taeho Suwon-si, KR 334 2697
Moon, Kyungsoo Suwon-si, KR 8 8
Namgung, Ran Suwon-si, KR 31 74
Woo, Changsoo Suwon-si, KR 17 13

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