Multi-component kernels for vector optical image simulation
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United States of America
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Nov 26, 2024
Grant Date -
Nov 16, 2023
app pub date -
Jul 28, 2023
filing date -
Jul 28, 2023
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Abstract
A method of enhancing a layout pattern includes determining a vector transmission cross coefficient (vector-TCC) operator of an optical system of a lithographic system based on an illumination source of the optical system and an exit pupil of the optical system of the lithographic system. The method also includes performing an optical proximity correction (OPC) operation of a layout pattern of a photo mask to generate an OPC corrected layout pattern. The OPC operation uses the vector-TCC operator to determine a projected pattern of the layout pattern of the photo mask on a wafer. The method includes producing the OPC corrected layout pattern on a mask blank to create a photo mask.
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