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United States of America

PATENT NO 12146076
APP PUB NO 20210079266A1
SERIAL NO

17090909

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Abstract

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The present invention relates to a composition for etching, comprising a first inorganic acid, a first additive represented by Chemical Formula 1, and a solvent.

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Patent Owner(s)

Patent OwnerAddress
SOULBRAIN CO LTDSEONGNAM-SI GYEONGGI-DO 13486

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Jin-Uk Seongnam-si, KR 31 175
Lim, Jung-Hun Seongnam-si, KR 16 67
Park, Jae-Wan Seongnam-si, KR 33 208

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