Substrate processing apparatus and substrate processing method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12142496
APP PUB NO 20200365422A1
SERIAL NO

15930561

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Importance

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Abstract

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A substrate processing apparatus includes a holder, a nozzle arm and a position adjusting device. The holder is configured to hold a substrate. The nozzle arm has a nozzle configured to supply a processing liquid to a peripheral portion of the substrate. The position adjusting device is provided at the nozzle arm and is configured to adjust a position of the substrate to a given position on the holder.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aiura, Kazuhiro Koshi, JP 21 85
Amano, Yoshifumi Koshi, JP 53 415

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