Processing system, processing method, measurement apparatus, substrate processing apparatus and article manufacturing method
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United States of America
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Nov 12, 2024
Grant Date -
Nov 9, 2023
app pub date -
Jun 23, 2023
filing date -
Jun 23, 2023
priority date (Note) -
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Abstract
The present invention provides a processing system that includes a first apparatus and a second apparatus, and processes a substrate, wherein the first apparatus includes a first measurement unit configured to detect a first structure and a second structure different from the first structure provided on the substrate, and measure a relative position between the first structure and the second structure, and the second apparatus includes an obtainment unit configured to obtain the relative position measured by the first measurement unit, a second measurement unit configured to detect the second structure and measure a position of the second structure, and a control unit configured to obtain a position of the first structure based on the relative position obtained by the obtainment unit and the position of the second structure measured by the second measurement unit.
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