Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography

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United States of America

PATENT NO 12140865
APP PUB NO 20200285148A1
SERIAL NO

16808661

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Abstract

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The present invention provides a method that utilizes an existing infrastructure such as atomic layer deposition or similar vapor-based deposition tool or metal salt solutions based infiltration to infiltrate certain metals or metal-based precursors into resist materials to enhance the performance of the resists for the advancement of lithography techniques.

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BROOKHAVEN SCIENCE ASSOCIATES LLC40 BROOKHAVEN AVE - P O BOX 5000 BLDG 460 UPTON NY 11973-5000

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Su Min Plano, US 1 1
Kim, Jiyoung Plano, US 112 411
Lu, Ming Stony Brook, US 165 2049
Nam, Chang-Yong Stony Brook, US 10 77
Stein, Aaron Huntington Station, US 30 225
Subramanian, Ashwanth Stony Brook, US 3 1
Tiwale, Nikhil Medford, US 3 1

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