Method for producing substance with modified carbon allotrope surface, method for producing substance with carbon allotrope surface into which functional group is introduced, method for producing grid for cryo-electron microscopy, organic substance, and grid for cryo-electron microscopy

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United States of America

PATENT NO 12139406
APP PUB NO 20220204346A1
SERIAL NO

17441971

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Abstract

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The present invention provides a method for producing a substance with a modified carbon allotrope surface that can suppress or prevent uneven distribution, uneven orientation, and the like of a structural analysis target substance in a structural analysis by cryo-electron microscopy. A method for producing a substance with a modified carbon allotrope surface of the present invention includes: the step of surface-treating by reacting a carbon allotrope surface with a halogen oxide radical, wherein the carbon allotrope surface is modified by the surface-treating.

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Patent Owner(s)

Patent OwnerAddress
OSAKA UNIVERSITY1-1 YAMADAOKA SUITA-SHI OSAKA 5650871 ?5650871

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adachi, Hiroaki Osaka, JP 59 452
Asahara, Haruyasu Osaka, JP 7 2
Doi, Takefumi Osaka, JP 4 0
Hirose, Mika Osaka, JP 1 0
Inoue, Tsuyoshi Osaka, JP 156 1391
Iwasaki, Kenji Osaka, JP 37 318
Miyazaki, Naoyuki Osaka, JP 5 73
Nakagawa, Atsushi Osaka, JP 120 3288
Ohkubo, Kei Osaka, JP 12 13
Takagi, Junichi Osaka, JP 69 732

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