Antenna mechanism and plasma processing device
Number of patents in Portfolio can not be more than 2000
United States of America
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Nov 5, 2024
Grant Date -
Mar 2, 2023
app pub date -
Mar 10, 2020
filing date -
Mar 10, 2020
priority date (Note) -
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Abstract
According to the present invention, provided is an antenna mechanism 3 that adjusts the impedance of an antenna body through which a high-frequency current flows to generate plasma by means of a simple configuration, and generates plasma P, and comprises: the antenna body 31 through which high-frequency current flows; and one or a plurality of adjustment circuits 32 provided adjacent to the antenna body 31. The adjustment circuit 32 has a metal conductor 321 forming a closed circuit and a capacitor 322 forming the closed circuit.
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