Device for measuring a substrate and method for correcting cyclic error components of an interferometer

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United States of America

PATENT NO 12135211
APP PUB NO 20220260359A1
SERIAL NO

17737209

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Abstract

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A device for measuring a substrate for semiconductor lithography with a reference interferometer for ascertaining the change in the ambient conditions, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, and a method for correcting cyclic error components in the reference interferometer using same.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STR 2 73447 OBERKOCHEN 73447

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Horn, Uwe Rudolstadt, DE 38 1087
Jaeckel, Oliver Jena, DE 3 2
Kutzner, Thomas Cospeda, DE 4 36
Zschaeck, Stephan Weissendorf, DE 1 0

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