Method for overlay metrology and apparatus thereof

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12130246
APP PUB NO 20220074875A1
SERIAL NO

17419653

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Abstract

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A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bhattacharyya, Kaustuve Veldhoven, NL 65 835
Den, Boef Arie Jeffrey Waalre, NL 263 4891
Mathijssen, Simon Gijsbert Josephus Rosmalen, NL 62 443

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